2L 100W Plasma Cleaner for Semiconductor/ 13.56 MHz Plasma Cleaner

    Model NO.: CY-P2L-B
    Origin: Henan, China
    Model NO.: CY-P2L-B
    Origin: Henan, China
    13.56MHz 2L Laboratory Plasma Cleaning Systme for Sale
     
    Featrues of plasma cleaning system


    1. Environmental technologies: plasma process is the role of gas - solid coherent reactor consumes no water resources, no need to add chemicals and no environmental pollution.
    2. Wide adaptability: regardless of processing substrate type, such as metals, semiconductors, oxides, and most of the polymer material can be a good deal
    3. Low temperature: close to room temperature, particularly suitable polymer materials, have a longer retention time and a higher surface tension than the corona and flame method
    4. Multifunctions: it involves only a shallow surface of polymer materials (10 -1000A), while preserving the characteristics of the material itself can give it one or more  new features
    5. Low cost: the device is simple, easy operation and maintenance, continuous operation,a few bottles of gas can replace thousands of kilograms cleaning fluid
    6. The whole process technology can be controlled: all the parameters can be setted by the computer and data recording
    7. Treated geometry Unlimited: Big or small, simple or complex, parts or textiles can be processed
     
    Application of plasma cleaning equipment
    1.Car industry: ignition coil engine oil seal film
    2.Defense industry: Aerospace electrical connectors,Kevlar deal
    3.Electronics industry: hard plastic parts, earphone, Cell phone cover
    4.Medical industry: intravenous infusion, catheter treatment
    5.Textile fiber,rubber and plastic industry and etc
     
    parmaters of plasma cleaner 
    Power supply: AC220v, 50/ 60 HZ
    Working current: Total working current not higher than 1.2A (Not include the vacuum pump)
    RF power: 100W
    RF frequency: 13.56MHz
    Characteristic impedance: 50 Ohm, Automatic matching
    Vacuum degree: 30Pa-100Pa
    Gas flow: 10-100mL/ min( adjustable)
    Process control: MCU automatic and manual mode
    Inside chamber size: customized
    Outside dimension: 440*390*200mm
    Weight: 50kg
    Vacuum chamber temperature: less than 65ºC
    Cooling type: Forced cooling

     2L 100W Plasma Cleaner for Semiconductor/ 13.56 MHz Plasma Cleaner



    2L 100W Plasma Cleaner for Semiconductor/ 13.56 MHz Plasma Cleaner
      13.56MHz 2L Laboratory Plasma Cleaning Systme for Sale
     
    Featrues of plasma cleaning system


    1. Environmental technologies: plasma process is the role of gas - solid coherent reactor consumes no water resources, no need to add chemicals and no environmental pollution.
    2. Wide adaptability: regardless of processing substrate type, such as metals, semiconductors, oxides, and most of the polymer material can be a good deal
    3. Low temperature: close to room temperature, particularly suitable polymer materials, have a longer retention time and a higher surface tension than the corona and flame method
    4. Multifunctions: it involves only a shallow surface of polymer materials (10 -1000A), while preserving the characteristics of the material itself can give it one or more  new features
    5. Low cost: the device is simple, easy operation and maintenance, continuous operation,a few bottles of gas can replace thousands of kilograms cleaning fluid
    6. The whole process technology can be controlled: all the parameters can be setted by the computer and data recording
    7. Treated geometry Unlimited: Big or small, simple or complex, parts or textiles can be processed
     
    Application of plasma cleaning equipment
    1.Car industry: ignition coil engine oil seal film
    2.Defense industry: Aerospace electrical connectors,Kevlar deal
    3.Electronics industry: hard plastic parts, earphone, Cell phone cover
    4.Medical industry: intravenous infusion, catheter treatment
    5.Textile fiber,rubber and plastic industry and etc
     
    parmaters of plasma cleaner 
    Power supply: AC220v, 50/ 60 HZ
    Working current: Total working current not higher than 1.2A (Not include the vacuum pump)
    RF power: 100W
    RF frequency: 13.56MHz
    Characteristic impedance: 50 Ohm, Automatic matching
    Vacuum degree: 30Pa-100Pa
    Gas flow: 10-100mL/ min( adjustable)
    Process control: MCU automatic and manual mode
    Inside chamber size: customized
    Outside dimension: 440*390*200mm
    Weight: 50kg
    Vacuum chamber temperature: less than 65ºC
    Cooling type: Forced cooling

     2L 100W Plasma Cleaner for Semiconductor/ 13.56 MHz Plasma Cleaner



    2L 100W Plasma Cleaner for Semiconductor/ 13.56 MHz Plasma Cleaner
     

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